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As the minimum feature size decreases, the tolerance for error of any of the steps in the fabrication process increases. This is because the presence of even a very small defect in a fabrication process can be magnified in a product fabricated on a large wafer or multiple dies. Consequently, improvements in the repeatability and/or the accuracy of a fabrication process may improve the quality and reliability of the resulting products, thereby increasing the yield and reducing the cost of fabrication.
The increase in miniaturization of features in integrated circuit devices has led to demands for increased accuracy in the process parameters. This, in turn, has resulted in the need for more precise monitoring of the fabrication process in order to provide the desired results.
Monitoring of the fabrication process is generally accomplished by using either a single optical monitor or a number of monitors. A single optical monitor may detect the endpoint of the fabrication process. A number of monitors may detect a variety of different parameters.
There are certain limitations to the current optical monitoring techniques. The single optical monitor which detects the endpoint of the fabrication process generally does so using a non-optical beam or, as is more typical, using a color code that indicates the end of the process. These monitors have limited sensitivity to wafer material or process variations. Also, the optical process monitor is not sensitive to the physical changes that may be occurring during the process. Therefore, 0b46394aab